CHICAGO, July 7, 2023 /PRNewswire/ -- The EUV lithography market is expected to reach USD 25.3 billion by 2028 from USD 9.4 billion in 2023, at a CAGR of 21.8% during the 2023–2028 period according to a new report by MarketsandMarkets™. Many semiconductor companies are investing in EUV lithography system and equipment which gives an opportunity for growth in the EUV lithography market. The EUV lithography market is in the development phase at present, with the presence of multiple players offering EUV equipment. Asia Pacific is likely to contribute significantly to the growth of the EUV lithography market. Similarly, the Americas and Europe are expected to be the growing market for the forecasted period.
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Extreme Ultraviolet (EUV) Lithography Market Report Scope:
Report Coverage | Details |
Market Revenue in 2023 | $9.4 billion |
Estimated Value by 2028 | $25.3 billion |
Growth Rate | Poised to grow at a CAGR of 21.8% |
Market Size Available for | 2019–2028 |
Forecast Period | 2023–2028 |
Forecast Units | Value (USD Million/Billion) |
Report Coverage | Revenue Forecast, Competitive Landscape, Growth Factors, and Trends |
Segments Covered | By Equipment, End User and Region |
Geographies Covered | North America, Europe, Asia Pacific, and Rest of World |
Key Market Challenge | Source power and productivity in EUV lithography act as a challenge for the market |
Key Market Opportunities | Advanced memory development for next-generation memory devices |
Key Market Drivers | Increasing complexity of the integrated circuit |
The Extreme Ultraviolet (EUV) light source segment is expected to grow at the highest CAGR of the EUV lithography equipment market during the forecast period.
EUV Lithography light source is a critical component utilized in EUV lithography systems within the semiconductor industry. Currently, the dominant technology for generating EUV light is laser-produced plasma (LP). A prominent example of such an LP EUV light source is the one developed by ASML, a leading manufacturer of semiconductor equipment. ASML's LP EUV light source employs a high-power pulse laser to irradiate tin (Sn) droplets or a thin tin film. The intense laser energy quickly heats and vaporizes the tin material, resulting in the creation of plasma. As the plasma cools and recombines, it emits EUV light with a wavelength of approximately 13.5 nanometers. This process is essential for enabling advanced semiconductor manufacturing using EUV lithography technology.
Multiple companies are expanding their business in EUV light sources. For instance, Energetiq Technology Inc. announced in December 2022 that the company is creating a distinct business segment for EUV light source products. The new EUV Business segment of the company will be responsible for assembling all the core technology, engineering, marketing, field service, and operations personnel under the guidance of the EUV general manager.
IDM is expected to have a significant growth in EUV lithography market.
An IDM, or Integrated Device Manufacturer, is a company that handles the complete process of designing, manufacturing, and marketing integrated circuits or chips internally. In the context of EUV Lithography, an IDM specializing in this technology would take full responsibility for all aspects related to EUV lithography, starting from designing and developing EUV lithography systems to fabricating integrated circuits utilizing EUV Lithography technology. As an IDM in EUV lithography, the company would possess expertise in both EUV lithography system design and semiconductor manufacturing. They would invest in research and development (R&D) to advance EUVL technology, optimize its performance, and enhance the manufacturing process. Typically, IDMs operate their own fabrication facilities equipped with EUV lithography systems to produce chips using this advanced technology.
EUV lithography plays a critical role in semiconductor manufacturing, and IDMs specializing in EUVL technology play a key role in driving its adoption and pushing the boundaries of integrated circuit capabilities. These companies contribute to the development of cutting-edge semiconductor devices by leveraging the advantages offered by EUV lithography.
ASML is a supplier of EUV lithography technology and systems to IDMs (Integrated Device Manufacturers), while other companies such as Carl Zeiss AG, TOPPAN Inc., and NTT Advanced Technology Corporation are also actively involved in the development of lithography equipment, including EUV lithography optics, light sources, masks, metrology tools, sensors, and EUV Lithography Subassembly products.
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South Korea is expected to grow at the highest CAGR in Asia Pacific region.
South Korea plays a significant role in the advancement and adoption of EUV (Extreme Ultraviolet) lithography. The country is known for its strong presence in the global semiconductor industry, with major players like Samsung and SK HYNIX INC. These companies have been actively investing in EUV technology and integrating it into their manufacturing processes. Samsung has made significant strides in EUV lithography and has been using it to produce cutting-edge semiconductor chips. With its technological expertise, research and development capabilities, and substantial investments in EUV infrastructure, South Korea contributes to the continued development and widespread implementation of EUV lithography, driving innovation in the semiconductor industry.
In March 2023 Samsung announced their plan to invest $230 billion over the next two decades in a semiconductor production mega cluster in South Korea. The new campus, located near Yongin, will feature five advanced fabs and aims to make South Korea the world's largest chip producer. The facilities will utilize extreme ultraviolet (EUV) lithography scanners, contributing to the adoption of cutting-edge fabrication technologies.
During the forecast period, Asia Pacific is expected to grow at the highest growth rate.
The Asia Pacific region plays a significant role in the realm of EUV (Extreme Ultraviolet) lithography, an advanced technology utilized in semiconductor manufacturing. When evaluating the extreme ultraviolet (EUV) lithography industry within this region, it encompasses countries such as China, Japan, Taiwan, South Korea, and other parts of Asia Pacific. The strong presence of chip manufacturers in these generates a high demand for EUV lithography, contributing to its continuous development and optimization. Furthermore, the Asia Pacific region boasts a large market for consumer electronics, including smartphones, tablets, and various electronic devices. The growing need for smaller, faster, and more energy-efficient semiconductors is driving the adoption of advanced lithography technologies such as EUV. EUV lithography enables the production of high-density and high-performance chips, which are crucial for meeting the requirements of the consumer electronics market in the Asia Pacific region.
Key Players
The report profiles key players in extreme ultraviolet (EUV) lithography companies such as ASML (Netherlands), Carl Zeiss AG(Germany), TOPPAN Inc.(Japan), NTT Advanced Technology Corporation(Japan), KLA Corporation(US), ADVANTEST CORPORATION(Japan), Ushio Inc.(Japan), SUSS MicroTec SE(Germany), AGC Inc.(Japan), Lasertec Corporation(Japan), NuFlare Technology(Japan), Energetiq Technology Inc.(US), Photronics, Inc.(US), HOYA Corporation(Japan), TRUMPF(Germany), Rigaku Corporation(Japan), Edmund Optics Ltd.(US), Park Systems(Korea), Zygo Corporation(US), Imagine Optic(US) and Applied Materials, Inc.(US).
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